Display for Sticker | blameF (Holo) | Shanghai 2024
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About Sticker blameF Shanghai 2024

Sticker blameF Shanghai 2024 is an autograph sticker featuring blameF’s signature rendered in a stylized script for the Perfect World Shanghai 2024 event. As a player sticker rather than a weapon finish, its design centers on the pro signature and tournament branding, making it distinct from standard CS2 stickers built around logos or graphic illustrations.

Release & Source

The Sticker blameF Shanghai 2024 can be found in the Shanghai 2024 Challengers Autograph Capsule.

Rarity

RarityExotic
Drop Chance~15%

The Sticker blameF (Holo) Shanghai 2024 is a Exotic-tier sticker with an estimated drop chance of ~15% per capsule, making it one of the more common stickers in CS2.

Popularity

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Community Rating

Frequently Asked Questions

When was the Perfect World Shanghai 2024 CS2 Major held?

The Perfect World Shanghai 2024 Major took place in late 2024 in Shanghai, China. Sticker blameF Shanghai 2024 was released as part of the event’s autograph sticker lineup, which ties it directly to that Major and its player capsule.

What is Sticker blameF Shanghai 2024?

Sticker blameF Shanghai 2024 is an autograph sticker item in CS2 featuring blameF’s signature from the Perfect World Shanghai 2024 Major. It belongs to the Shanghai 2024 Challengers Autograph Capsule and is classified as Exotic rarity.

What crafts work well with Sticker blameF Shanghai 2024?

This sticker works best on clean, darker finishes where the autograph remains readable, such as AK-47 Slate, M4A1-S Night Terror, USP-S Stainless, or Desert Eagle Night. For multi-sticker crafts, keeping all four slots to matching Shanghai 2024 autograph stickers usually looks more consistent than mixing event styles.

Is Sticker blameF Shanghai 2024 a good sticker for autograph collectors?

It can make sense for collectors who focus on Major autograph sets, Danish players, or blameF-specific items. Its relevance comes from the Shanghai 2024 event connection and the player signature itself, rather than any weapon finish or wear-based variation.